European Tender Two Parallel Plate Plasma-enhanced Chemical Vapor Deposition (PECVD) Systems

Omschrijving van de opdrachtgever

The University of Twente is tendering to purchase two new Plasma-Enhanced Chemical Vapor Deposition systems. The MESA+ Institute will invest in two new systems for deposition of (doped) dielectric thin films to upgrade and reinforce their state-of-the-art thin film technology and processing capacity. The systems will be used for moderate-temperature deposition of low stress thin films. For the following materials: silicon dioxide (SiO2) boron-doped SiO2 (BSG) phosphorus-doped SiO2 (PSG) boron-phosphorus-doped SiO2 (BPSG) low-stress silicon nitride (SiNx) silicon oxynitride (SiOxNy) amorphous silicon (aSi)